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Participants from around the world will meet September 2-7, 2018 in Shanghai, China for the 20th International Conference on Molecular Beam Epitaxy, ICMBE. Molecular Beam Epitaxy (MBE) is an ultra-high vacuum (UHV) thin-film deposition technique.

The program schedule includes topics around advances in MBE techniques, novel materials, and innovative new devices. The highlight of the conference will be an invited talk by the “Father of MBE,” Al Cho, on the historical development of the MBE technique.

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